摘要
LIGAtechniquehasbeendevelopedsince1993atBSRF,includingthefabricationofLIGAmask,deepX-rayLithography,electroplating,thepouringmoldingandtheapplicationsinsomefields.TheLIGAmaskwithgoldabsorbingstructuresof20μmthicknessand5μmwidthandKaptonmembraneofaround5μmthicnesshasbeensuccessfullfabricatedandappliedtothedeepX-raylithographywiththePMMAstructureof1mmthicknessorobove.thebeamlineformawigglerisusedforthedeepX-raylithographyofLIGAstatiionandisopentootheinstitutesresearchingthedeepX-raylithography.ThenormalprocessofLIGAtechniquewiththeexceptionofmoldinghasbeenestablishedwiththePMMAstructuresof500μmthicknessatBSRF.ThelargestaspectratioofPMMAstructruescanreachabout50withtheheightof500μmandthelateralsiaeof10μm.Thenickelandcopperstructureswiththetheicknessof0.5mmand1mmhavebeenmadebyusingtheelectroplatingtechnique.TheSU8asaresistmaterialofdeepetchlithographywithUVlightisalsodevelopedinthefabricationofLIGAmaskandsomedevicesatBSRF.Electromagneticsteppingmicromotor,haetexchange,accelerator,structuresusedintheEDM(electrodischargemachinging)arebeingdevelopedforthefutureapplications.
出版日期
2001年02月12日（中国期刊网平台首次上网日期，不代表论文的发表时间）
