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Behavior of Deuterium in Boron Films Covered by Oxygen-Containing Layer

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DOI lj1ek732dv/401220

作者 WANG Mingxu;H. Miyauchi;T. Nakahata;Y. Nishikawa;Y. Oya;N. Noda;K. Okuno

机构地区不详

出处《核工业西南物理研究院年报：英文版》 2004年1期

关键词氘硼薄膜含氧层覆盖材料反应堆核聚变

分类 [理学][物理]

出版日期 2004年01月11日（中国期刊网平台首次上网日期，不代表论文的发表时间）

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来源期刊

核工业西南物理研究院年报：英文版

核工业西南物理研究院年报：英文版

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相关关键词

氘硼薄膜含氧层覆盖材料反应堆核聚变

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