摘要
Thispaperdemonstratesanewprocessofthephotolithographytechnology,usedtofabricatesimplyfinepatterns,byemployingsurfaceplasmoncharacter.Thesub-wavelengthperiodicsilicastructureswithuniformsilverfilmareusedastheexposuremask.Accordingtothetraditionalsemiconductorprocess,thegratingstructuresarefabricatedatexposingwavelengthof436nm.Atthesametime,itprovidesadditionalandquantitativesupportofthistechniquebasedonthefinite-differencetime-domainmethod.Theresultsoftheresearchshowthatsurfaceplasmoncharacteristicsofmetalscanbeusedtoincreasetheopticalfieldenergydistributiondifferencesthroughthesilicastructureswithsilverfilm,whichdirectlyimpactontheexposureoffollowingphotosensitivelayerindifferentregions.
出版日期
2010年11月21日（中国期刊网平台首次上网日期，不代表论文的发表时间）
