简介:WehavedepositedW/Simultilayermirrorsusingthemagnetronsputteringunderthelowsputteringpressureandthehighmagneticfieldstrength,andmeasuredtheirreflectivtityinBeijingsynchrotronradiationfaciltiy,W/Simultilayershowthepeakreflectivityofapproximately10%ataphotonenergyof1200eVand10.5%ataphotoenergyof700eVrespectivelyattheincidenceangleof81°。