简介:Developinganelectrostaticdischarge(ESD)protectiondevicewithabetterlatch-upimmunityhasbeenachallengingissueforthenanometercomplementarymetal-oxidesemiconductor(CMOS)technology.Inthiswork,animprovedgrounded-gateN-channelmetal-oxidesemiconductor(GGNMOS)transistortriggeredsilicon-controlledrectifier(SCR)structure,namedGGSCR,isproposedforhighholdingvoltageESDprotectionapplications.TheGGSCRdemonstratesadoublesnapbackbehaviorasaresultofprogressivetrigger-onoftheGGNMOSandSCR.Thedoublesnapbackmakestheholdingvoltageincreasefrom3.43Vto6.25Vascomparedwiththeconventionallow-voltageSCR.TheTCADsimulationsarecarriedouttoverifythemodesofoperationofthedevice.
简介:一个新奇帮助多晶硅的控制硅的整流器(SCR)被介绍;在这篇论文分析了,它在HHNEC的0.18μm电可擦可编程只读存储器过程被制作。帮助多晶硅的SCR利用多晶硅层没有占据额外的布局区域,由通行证帮助静电的分泌物(ESD)电流。TLP当前电压(I-V)测量结果显示出给一样的布局区域那,帮助多晶硅的SCR的坚韧性性能能被改进到3次常规MLSCR的。而且,一个手指如此的帮助多晶硅的SCR,占据仅仅947μm,2]布局区域,能经历7-kVHBMESD应力。结果进一步证明帮助多晶硅的SCR的S类型I-V特征对由改变设备尺寸的不同操作条件可调节。与传统的SCR相比,这新SCR能绕过更多的ESD水流;消费更小的IC区域。