简介：AdhesionimprovementofCVDdiamondfilimbyintroducinganelectro-depositedinterlayer;Agitation:themostversatiledegreeoffreedomforsurfacefinishers;Developmentofhydroxyapatitecoatingonporoustitaniumviaelectro-depositiontechnique;EffectofintensemagneticfieldonCdTeelectro-deposition;ElectrodepositionofMetallicLithiumonaTungstenElectrodein1-Butyl-l-methylpyrrolidiniumBis(tritluoromethanesulfone)imideRoom-temperatureMoltenSalt

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简介：[篇名]Bi-2212:AnHTSCoatedConductor,[篇名]Carbonnanotube-perovskite-compositesasnewelectrodematerial,[篇名]CeO{sub}2bufferlayerbypulsedlaserdepositionforYBCOcoatedconductor,[篇名]CeO{sub)2BufferLayersDepositedbyPulsedLaserDepositionforTFA-MODYBa{sub}2Cu{sub}3O{sub)(7-x)SuperconductingTape,[篇名]Characteristicofthin-filmNTCthermalSensors,[篇名]Characteristicsofcobalt-dopedzincoxidethinfilmspreparedbypulsedlaserdeposition,[篇名]CharacteristicsofTiO{sub}2ThinFilmasaPhotocatalystPrepardUsing-thePulsedLaserDepositionMethod.

简介：Co-dopingDepositionofp-typeZnOThinFilmsusingKrFExcimerLaserAblation;ComparisonofGrowthMorphologyinGe(001)HomoepitaxyUsingPulsedLaserDepositionandMBE;CompositionandstructureofBCNfilmspreparedbyionbeam-assistedpulsedlaserdeposition;Compositionofβ-FeSi{sub}2thin-filmsgrownbyapulsedlaserdepositionmethod

简介：SY509-3-202[篇名]Influenceofthetemperaturedistributiononchemicaldepositionininternalproblems；SY509-3-203[篇名]ManufacturingReliableUnlaededViasWithoutCVDBarrierLayers；……

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简介：[篇名]Electro-depositionoftantalumontumgstenandnickelinLiF-NaF-CaF{sub}2meltcontainingK{sub}2TaF{sub}7electrochemicalstudy,[篇名]Electro-EpitaxialBufferLaycrsforREBCOTspeArchitectures,[篇名]EQCMwithair-gapexcitationelectrode.Calibrationtestswithcopperandoxygencoatings,[篇名]FormationofWell-definedNanocolumnsbyIonTrackingLithography,[篇名]Fundamentalexperimentalstudyonfreefabricationofnanocrystallinecopperbulkbyselectiveelectrodepositionwithelectrolytejet,[篇名]Magneticnanowirearraysobtainedbyelectro-depositioninorderedaluminatemplates,[篇名]Morphologicalcharacteristicsofnickelparticleselectrodepositedfromchloridedominantsolution.

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简介：SY509-3-209[篇名]CrystallinePropertiesofFerroelectric-RelaxorPMN-PIThinFilmsbyPulsedLaserDeposition；SY509-3-210[篇名]CuprateBasedOxideSuperlatticesShowingSimultaneouslySuperconductingandFerromagneticProperties；……

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简介：AComputationalStudyofGasPhaseChemistryinCarbonNanotubeSynthessbyPECVD;AfieldpointbasedapproachforsensorconditioninginMO-CVDreactors;AMethodforReal-TimeControlofThinFilmCompositionUsingOESandXPS;Amechanism-basedmodelofchemicalvapordepositionofepitaxialSi{sub}(1-x)Ge{sub}xflirts

简介：SY509-3-196[篇名]Anovelstrainedsurface-channelpMOSFETSi{sub}0.7Ge{sub}0.3withanALDTiN/AI{sub}20{sub}3/HfAIO{sub}x/AI{sub}20{sub}3gatestack；SY509-3-197[篇名]Aquantitativestudyofthenano-scratchbehaviorofboronandcarbonnitridefilms；……

简介：[篇名]1.55-umsilicon-basedreflection-typewaveguide-integratedthermo-opticswitch,[篇名]120×90ElementThermoelectricInfraredFocalPlaneArraywithPreciselyPatternedAu-blackAbsorber,[篇名]4H-SiCEpitaxialGrowthfcrHigh-PowerDevices,[篇名]A90nmgenerationcopperdualdamascenetechnologywithALDTaNbarrier,[篇名]Acomparativemicrotribologicalinvestigationofdiamond-likecarbonfilmsforapplicationsinmicrosystems,[篇名]Acomparisonofmicrocrystailinesiliconpreparedbyplasma-enhancedchemicalvapordepositionandhot-wirechemicalvapordeposition:electronicanddeviceproperties.

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简介：为了制备一种骨架稳定的有机镁燃料电池多孔镁电极,通过扫描电镜、能谱分析及电化学方法研究了在1mol/LEtMgBr/THF的电解质溶液中,镁在金属镍和铜2种基体上沉积的电化学行为。结果表明：镁在2种金属基体上均可以发生沉积,而且在铜基体上还能够形成一层连续的镀层。采用在预镀铜的泡沫镍基体上电沉积镁的方法制备了一种新型骨架稳定的多孔镁电极,这种多孔镁电极的放电性能优于平板状的镁电极。

简介：为研究复合离子液体中电沉积制备Ir的工艺过程,探讨添加剂N,N-二甲基乙酰胺（DMAC）对BMIC-BMIBF4复合离子液体黏度、电导率及电化学稳定性的影响,分析IrCl3在该复合体系中的电化学行为,并在不同电位下恒电位电沉积Ir层。采用扫描电镜及X射线衍射仪对沉积层形貌及组成进行表征。结果表明：DMAC的加入使复合体系的黏度降低、电导率升高、电化学稳定性提高;金电极上的循环伏安测试表明,Ir3＋通过一步还原反应生成单质Ir的过程是受扩散速率控制的不可逆过程,其平均转移系数为0.170,扩散系数为1.096×10-6cm^2/s;SEM显示,在还原峰电位处可以获得较为致密、平整的Ir层,而XRD谱表明Ir层为多晶结构。