简介:Thisspecialissuecontainsselectedpapersfromthe2016NationalConferenceonHighVoltageandDischargePlasmas(HVDP),whichwashostedbythePlasmasandtheirApplicationsCommittee,ChinaElectrotechnicalSociety,andheldinBeijing,China,on26and27November2016.Theconferencewasattendedbyover430delegatesfrom110universities,researchinstitutesandenterprises.Intotal,280abstractsand132fullpapershavebeensubmitted,givingawonderfulassemblyoftechnicalcontributionsfromaroundChina.
简介:BasedonthesinglebiasingelectrodeexperimentstooptimizetheconfinementofplasmainthedeviceofKT-5Ctokamak,dual-biasingelectrodeswereinsertedintotheKT5Cplasmaforthefirsttimetoexploretheenhancingeffectsofbiasingandthemechanismsofthebiasing.Bymeansofapplyingdifferentcombinationsofbiasingvoltagesontothedualelectrodes,thechangesofE_r,whicharethekeyfactorforboostinguptheE_r×Bflowshear,wereobserved.Thetimeevolutionshowedthattheinnerelectrodeplayedamajorroleindual-biasing,whichdrewlargercurrentthantheouterone.Theouterelectrodeproducedlittleinfluence.Itturnedoutthatthedual-biasingelectrodeswereaseffectiveasasingleoneinimprovingtheplasmaconfinement,forthemechanismofbiasingwasessentiallyanedgeeffect.