Employing SiO2 Buffer Layer to Improve Adhesion of the Frequency-doubled Antireflection Coating on LBO

(整期优先)网络出版时间:2009-06-16
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Frequency-doubledantireflectioncoatingssimultaneouslyeffectiveat1064nmand532nmweredepositedonthelithiumtriborate(LiB3O5orLBO)crystalsusingtheelectronbeamevaporationmethod.Comparingwiththesamplewithoutbufferlayer,itisfoundthattheadhesionofthesamplewithbufferlayerofSiO2betweencoatingandLBOsubstrateisimprovedsignificantlyfrom137.4mNtogreaterthan200mN.Andthelaser-induceddamagethresholdisincreasedby20%from15.1J/cm2to18.6J/cm2.ThestrengtheningmechanismofadhesionofthebufferlayerofSiO2isdiscussedbyconsideringfullplasticindentationandsheartheory.