简介:AnewtechniqueofthesynthesisofNanocrystallineDiamond(NCD)Filmsbyheliconwaveplasma(HWP)chemicalvapordepositionatroomtemperaturewasreported.ThegrowthmorphologyandtheroughnessofNCDsampleswascharacterizedusingfiledemissionscanningelectronmicroscopy(SEM-SU8010)andatomforcemicroscopy(AFM),respectively.Theresultsshowthegrowthrateofthefilmwasveryfast,about833nm/min.TypicalG,Dbands