简介:本文首次利用异常衍射精细结构谱(DAFS)分析技术对多层膜中的NiFe和Cu的精细结构进行了分析。从DAFS谱中,我们提取出Ni和Cu的精细结构谱,从而可以单独研究多层膜中NiFe和Cu的精细结构。与荧光EXAFS谱的比较表明,两种方法得到的谱线完全一致。该技术为研究超薄多层膜的精细结构提供一种强有力的工具。
简介:Ahighlyreliableinterfaceofself-alignedbarrierCuSiNthinlayerbetweentheCufilmandthenano-porousSiC:H(p-SiC:H)cappingbarrier(k=3.3)hasbeendevelopedinthepresentwork.Withtheintroductionofself-alignedbarrier(SAB)CuSiNbetweenaCufilmandap-SiC:Hcappingbarrier,theinterfacialthermalstabilityandtheadhesionoftheCu/p-SiC:Hfilmareconsiderablyenhanced.AsignificantimprovementofadhesionstrengthandthermalstabilityofCu/p-SiC:H/SiOC:Hfilmstackhasbeenachievedbyoptimizingthepre-cleanstepbeforecap-layerdepositionandbyformingtheCuSiN-likephase.ThiscaplayeronthesurfaceoftheCucanprovideamorecohesiveinterfaceandeffectivelysuppressCuatommigrationaswell.
简介:Inordertotransfertheheatfromthearmortothecoolant,tungstenhastobeconnectedwithacopperheatsink.Thejointtechnologyisthemostcriticalissueformanufacturingplasmafacingcomponents.Consequently,thereliabilityofthejointsshouldbeverifiedbyagreatnumberofhigh-heat-flux(HHF)teststosimulatetherealloadconditions.W/CubrazedjointtechnologywithsliverfreefillermetalCuMnNihasbeendevelopedatSouthwesternInstituteofPhysics(SWIP).Screeningandthermalfatiguetestsofonesmall-scaleflattileW/CuCrZrmockupwereperformedona60kWelectron-beamMaterialtestingscenario(EMS-60)constructedrecentlyatSWIP.Themodulesuccessfullysurvivedscreeningtestwiththeabsorbedpowerdensity(Pabs)of2MW/m2to10MW/m2andthefollowing1000cyclesatPabsof7.2MW/m2withouthotspotsandoverheatingzonesduringthewholetestcampaign.MetallurgyandSEMobservationsdidnotfindanycracksatbothsidesandtheinterface,indicatingagoodbondingofWandCuCrZralloy.Inaddition,finiteelementsimulationsbyANSYS12.0underexperimentalloadconditionswereperformedandcomparedwithexperimentalresults.
简介:Inthisstudy,tungsten(W)wascoatedonacopper(Cu)substratebyusingdouble-glowdischargetechniqueusingapureWpanelasthetargetandargon(Ar)asthedischargeandsputteringgas.ThecrystalstructureoftheWcoatingwasexaminedbyX-raydiffraction(XRD).Scanningelectronmicroscopy(SEM)wasperformedwithcross-sectionimagestoinvestigatethepenetrationdepthofWintotheCubody.Additionally,thepropertiesofwearabilityresistance,corrosionresistanceandmechanicalstrengthoftheWcoatedCumatrixwerealsomeasured.Itisconcludedthatindouble-glowplasma,WcoatedCucanbefacilelyprepared.ItisnoticedthatthetreatmenttemperatureheavilydominatesthepropertiesoftheW-Cucomposite.
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简介:Significantelectromagneticpulses(EMP)canbegeneratedbytheintensivelaserirradiatingsolidtargetsininertialconfinementfusion(ICF).ToevaluatetheEMPintensityanddistributioninandoutsidethelaserchamber,wedesignedandfabricatedadisconeantennawithultra-widebandsofover10GHz.Thereturnloss(S11parameter)ofthisantennawasbelow-10dBandcouldevenachieveunder-30dBat3.1GHz.TheEMPintensityinthisstudyat80cmand40cmawayfromthetargetchambercenter(TCC)reached400kV/mand2000kV/m.ThecurrentresultsareexpectedtoofferpreliminaryinformationtostudyphysicsregardinglaserplasmainteractionsandwillalsolayexperimentalfoundationforEMIshieldingdesigntoprotectvariousdiagnostics.
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简介:本文利用X射线小角衍射和漫散射技术研究了两组具有不同GMR的NiFe/Cu多层膜样品的界面结构。利用在CuK吸收边附近的能量扫描得出了关于NiFe和Cu层的结晶性情况。结果表明两组样品在界面结构和结构性上有明显的区别。另外,我们还发现NiFe和Cu层的原子密度差别比块材料的差别大27%。
简介:Highsolid-solubilityCo15Cu35alloyshavebeenpreparedbymeltspinningandsubmittedtoisothermalandanisothermalannealingtoobtaingranularalloys.TheX-raydiffraction(XRD)patternsweremeasuredtoinvesugatethedecompositionofsupersaturatedsolidsolutioninducedbyannealing.Theatomicdiffusionandstructuralevolutionduringtheheattreatmentwereinvestigated.Inviewoftheproblemslimitingtheirappllcation.thehigh-fieldmagneazationcurvesweremeasured.Byafittothehigh-fieldmagnetizationcurves,thegranuiaralloysarefoundhardtobemagneticallysaturatedattheearlystageofnucleationandgrowth.Themagnetizationbehaviorwascorrelacedtotheannealed-inducedstructurealevolutionandalsotothemagnetoresistanceeffect.
简介:利用XRD、TPR和EXAFS等手段考察了焙烧温度对Cu/MnO2/ZrO2催化剂性能影响,结果表明,随着焙烧温度增加,铜的配位环境发生变化,铜和锰之间相互作用增强,有效地防止铜组分在还原及反应过程中聚集长大,从而使催化剂活性显著增加,当催化剂经过高温焙烧,催化剂活性由于ZrO2结晶和铜的聚集而降低。
简介:用磁控溅射方法制备了一系列[C(t)/Cu(2.04nm))In(n=20,30)周期多层膜,利用四端点法、振动样品磁强计研究了多层膜的电磁性质,样品的磁电阻随钴亚层厚度的增大有一最佳值t=1.2nm。利用同步辐射掠入射X射线散射(衍射)技术在不同的X射线能量下研究了耦合多层腹的界面结构,探索了耦合多层膜中磁电阻增强的可能原因。