简介:Alooplessgraphonnverticesinwhichverticesareconnectedatleastbyaandatmostbybedgesiscalleda(a,b,n)-graph.A(b,b,n)-graphiscalled(b,n)-graphandisdenotedbyKbn(itisacompletegraph),itscomplementbyKbn.Anonincreasingsequencep=(d1,…,dn)ofnonnegativeintegersissaidtobe(a,b,n)graphicifitisrealizablebyan(a,b,n)-graph.Wesayasimplegraphicsequencep=(d1,…,dn)ispotentiallyK4—K2[K2-graphicifithasaarealizationcontaininganK4—K2[K2asasubgraphwhereK4isacompletegraphonfourverticesandK2[K2isasetofindependentedges.Inthispaper,wefindthesmallestdegreesumsuchthateveryn-termgraphicalsequencecontainsK4—K2[K2assubgraph.
简介:InallthearticlesinActaMechanicaSolidaSinica,Volume31,Issues1-4thecopyrightisincorrectlydisplayedas"TheChineseSocietyofTheoreticalandAppliedMechanicsandTechnology"whereitshouldbe"TheChineseSocietyofTheoreticalandAppliedMechanics".
简介:Wehavedesignedandrealizedanathermal4-channelwavelength(de-)multiplexerinsiliconnitride(SIN).Minimizedthermalsensitivityisachievedinawidewavelengthrangebyusingwideandnarrowwaveguideswithlowanddifferentthermal-opticcoefficientsinthetwoarmsofMach-Zehnderinterferometers(MZIs).TheSiNcorelayerandSiO2claddinglayersaredepositedbyalow-temperatureplasma-enhancedchemicalvapordep-ositionprocess.ThefabricatedMZIfilterexhibitsathermalsensitivitywithin4-2.0pm/℃inawavelengthrangeof55nmtonear1300nm.Then,anathermal(de-)multiplexerbasedoncascadedMZIshasbeendemonstratedwithacrosstalk〈-22dBandathermalsensitivity〈4.8pm/℃forallfourchannels,reducedby77%comparedtoaconventionalSiN(de-)multiplexer.OwingtothepassiveoperationandcompatibilitywiththeCMOSback-endprocess,ourdeviceshavepotentialapplicationsin3Dintegrationofphotonicsandelectronics.
简介:Inthiswork,SMAT(surfacemechanicalattritiontreatment)wasperformedonTi6Al4V.PlasmanitridingoftheSMATedsampleswasinvestigatedincomparisonwithcoarse-grainedsamples.Thesampleswerecharacterizedusingopticmicroscope,SEM,TEMandVickersmicrohardnesstester.TheresultsshowedthatasignificantlythickercompoundlayerwithhigherhardnesswasobtainedfortheSMATedsampleswhencomparedwithun-SMATedsamplesafternitriding.CorrosionresistanceofTi6Al4VinaRinger’ssolutionwasstudiedbyelectrochemicaltechniquesincludingopencircuitpotentialmeasurement,potentiodynamicpolarizationandEIS(electrochemicalimpedancespectroscopy).Overall,ourresultsidentifiedthebeneficialimpactsoftheduplexSMAT/nitridingtreatmentoncorrosionbehaviourofTi6Al4V.Weartestswerealsoperformedonaball-on-disctribometerwherethetreatedsampleswererubbedagainsta6mmdiameteraluminaballunderanormalloadof5NusingRinger’ssolutionaslubricantmedia.ThefrictioncoefficientoftheSMATedandnitridedsampleswasreducedcomparedtotheuntreatedsamples.WearratesdemonstratedthatSMATcombinedwithnitridingimprovedwearresistanceofTi6Al4Valloy.
简介:ThenovelverticallystandingPtSe2filmontransparentquartzwaspreparedbyselenizationofplatinumfilmdepositedbythemagnetronsputteringmethod,andanNd:LuVO4passivelymode-lockedsolid-statelaserwasrealizedbyusingthefabricatedPtSe2filmasasaturableabsorber.TheX-raydiffractionpatternandRamanspectrumofthefilmindicateitsgoodcrystallinitywithalayeredstructure.ThethicknessofPtSe2filmismeasuredtobe24nmaccordingtothecross-sectionheightprofileoftheatomicforcemicroscopeimage.High-resolutiontransmissionelectronmicroscopyimagesclearlydemonstrateitsverticallystandingstructurewithaninterlayerdistanceof0.54nmalongthec-axisdirection.Themodulationdepth(AT)andsaturationfluence(Фs)ofPtSe2filmaremeasuredtobe12.6%and17.1μJ/cm2,respectively.Theobtainedmode-lockedlaserspectrumhasacentralwavelengthof1066.573nm,witha3dBbandwidthof0.106nm.Thetransformlimitedpulsewidthofthemode-lockedlaserwascalculatedtobe15.8ps.Amaximumaverageoutputpowerof180mWwithaworkingrepetitionrateof61.3MHzisobtained.Tothebestofourknowledge,thisisthefirstreportofthegenerationofultrafastmode-lockedlaserpulsesbyusinglayeredPtSe2asasaturableabsorber.